Jan 24, 2024 Leave a message

The difference between sputtering technology and sputtering targets and their uses

99.95% W Sputtering Targets
 

Various types of sputtered film materials have been widely used in semiconductor integrated circuits, recording media, flat displays, and tool and mold surface coatings.

 

9995Tungsten Sputtering Targets

99.95% Tungsten Titanium Sputtering Target
 

 

Sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, LCD screens, laser memories, electronic control equipment, etc.; they can also be used in the field of glass coating; they can also be used in wear-resistant materials, high-temperature corrosion resistance , high-end decorative supplies and other industries.

There are many types of sputtering targets, and there are different methods for classifying targets:

According to the composition, it can be divided into metal targets, alloy targets, and ceramic compound targets.

 

Tungsten Sputtering Target manufacture

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According to the shape, it is divided into long target, square target and round target.

According to the application field, it is divided into microelectronic targets, magnetic recording targets, optical disc targets, precious metal targets, film resistance targets, conductive film targets, surface modified targets, mask layer targets, decorative layer targets, Electrode target materials and other target materials.

According to different applications, they are divided into semiconductor-related ceramic targets, recording medium ceramic targets, display ceramic targets, superconducting ceramic targets and giant magnetoresistance ceramic targets.

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