May 29, 2025 Leave a message

Tungsten Target Purity VS Tantalum Target Purity

Zhenan tungsten target product PDF document, click to download

 

Tungsten target material ‌
The semiconductor field usually requires a purity of ≥99.95% (3N5), and high-end chip manufacturing requires 99.9995% (5N5).
Industrial applications (such as coatings and cutting tools) can accept a purity of 99.9% (3N).

‌Tantalum target material ‌
Basic application purity is ≥99.9% (3N), while the semiconductor field generally requires 99.995% (4N5) to 99.999% (5N).
Electronic components such as capacitors even require more than 99.9995% (5N5).

 

Zhenan tungsten target product details picture display

 

High Purity Tungsten Sputtering Target manufacture
tungsten target
High Purity w Sputtering Target company
tungsten target metal

Zhenan tungsten target product parameter table

Purity(wt%) Density (%) Grain Size (μm) Dimension (max.) Ra
99.995 ≥19.18 ﹤50 18"x 0.4" ≤1.6
99.999 ≥19.18 ﹤50 18"x 0.4" ≤1.6

 

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